Gas Analysis
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Advanced process expert for Multi-Pressure ALD/CVD and Etch.
- xParts coated for extended lifetime in harsh chemistry
- Multi pressure sampling inlet
- Detection limit below 10 ppb
- Industry leading pumping speed
Advanced process expert for Single Pressure ALD/CVD and Etch.
- xParts coated for extended lifetime in harsh chemistry
- High temperature single pressure inlet
- Detection limit below 10 ppb
- Industry leading pumping speed
Provide real-time leak detection, endpoint detection and process monitoring for cutting-edge semiconductor manufacturing processes and other gas analysis applications
- Operating range from 1 Torr up to 450 Torr
- Superior detection limit < 1 ppm
- Long-term reliability: no pumps required
- Easy installation using a standard KF25 connection
Extreme PVD Process Monitoring Quadrupole Mass Spectrometer
- Industry leading maximum operating pressure
- Optional overpressure isolation valve interlock
- Scans up to 100 amu
High speed chamber leak test - gas analysis
- High speed leak detection allows chamber leak test
- Smart algorithm for easy integration
- Long life time, no filament burns, air inrush protection
- Withstand process chemistry
Optimize your combustion efficiency
- Displays efficiency, O2, CO2, CO and flue gas temperature readings all on one screen
- Easy-to-read backlit display
- Monitor system pressures with built-in manometer and hose kit
- QR code for quick analysis reports using the FLUE-Mate mobile app
High performance quadrupole mass spectrometer
- Nine-decade dynamic range
- Industry leading data collection rate
- Interchangeable sensors and electronics
- Scans up to 300 amu
Multi-Purpose Quadrupole Mass Spectrometer
- Nine-decade dynamic range
- Interchangeable sensors and electronics
- Optional continuous dynode electron multiplier
- Scans up to 200 amu
Versatile process monitoring from baseline to process pressure
- Ideal semiconductor process monitor
- Multi pressure sampling inlet
- Detection limit below 1 ppm
- Integrated differential pumping
Process monitoring at target pressure range
- Targeted high pressure processes
- Single pressure sampling inlet
- Detection limit below 1 ppm
- Integrated differential pumping system
Provide real-time leak detection and endpoint detection for critical process environments
- Operating range of 10 mTorr to 1 Torr
- Excellent detection limits down to low ppm levels
- Long-term reliability: no pumps required
- Easy installation using a standard KF25 connection
Allows the Transpector CPM to become a mobile troubleshooting instrument
- Flexible enough to get a Transpector CPM where you need it
- A small footprint to fit in those tight spaces
- A complete system able to hold everything needed to run the Transpector CPM
QMG 700 Analytical Mass Spectrometer to break through detection barriers and propel your process to the next level of innovation
- Mass range options from 1-512 amu
- More than nine decades of dynamic range
- Extremely fast measurement speeds: 0.125 ms/amu
- MDPP < 10E-16 mbar