Quantus® LP100+
Real-Time Gas Analysis and Endpoint Detection
Process monitoring during semiconductor manufacturing has become increasingly critical as technological advances push processes to their limits. Even trace amounts of contamination can significantly impact outcomes, making real-time leak and endpoint detection essential in critical process environments. The INFICON Quantus® LP100+ gas analyzer is designed to instantly identify and react to small changes, minimizing wafer scrap and improving yields.
Based on Self-Plasma Optical Emission Spectroscopy (SPOES) technology, the Quantus LP100+ provides exceptional detection limit down to the low ppm range and is flexible with installation locations, whether on the chamber or pump line.
Engineered with a unique sensor design, Quantus LP100+ offers unparallel advantages compared to traditional OES products. The sensor generates a localized plasma in its plasma cell, extending the capabilities of OES-based gas analyzers beyond plasma chamber installations to non-plasma chambers and other tool locations such as the foreline or exhaust line. With an operating range of 10 mTorr to 1 Torr without requiring expensive pumping systems, the Quantus LP100+ is compatible with many processes while requiring minimal maintenance and offering a low cost of ownership.
Quantus LP100+ easily connects to the system using a standard KF25 port. Its small footprint ensures it does not interfere with day-to-day operations that occur in and around a process tool.
Features
- Operating range of 10 mTorr to 1 Torr
- Excellent detection limits down to low ppm level
- Easy installation using a standard KF25 connection
- Fast 10 Hz sampling rate
- Low maintenance, long-term reliability
- Low cost of ownership, no pumps or consumables required
- Convenient field-replaceable plasma cell
- Small footprint: (H x W x L) 87 x 150 x 241 mm (3.4 x 5.9 x 9.5 in.)
- Support by experienced field-trained INFICON engineers
Specifications
| Operating pressure | 10 mTorr to 1 Torr (application dependent) |
| Spectrometer performance | 200–850 nanometer wavelengths (UV-VIS) 16-bit full-scale resolution, 3648 pixels |
| Detection limit | To low ppm levels (application dependent) |
| Exposure time | Minimum of 1 ms |
| Vacuum fitting | KF25 |
