Mass Spectrometers
High-performance mass spectrometers from INFICON deliver precise gas analysis for semiconductor manufacturing processes, industrial coating and vacuum processes, research, and environmental monitoring. Our advanced technology enables real-time detection of trace gases to improve quality control and process efficiency while minimizing equipment downtime.
Reset the filters to get results.
Surpass detection limits and elevate your process to new heights of innovation.
- Advanced digital platform allows communication over OPC UA
- Seamless OEM integration
- Ion source options for Diverse Applications
- Fully compatible with the complete FabGuard® software suite for unparalleled diagnostics
- 90° off-axis SEM to minimize noise from radicals and non-ionized particles
- Unparalleled precision and sensitivity with single ion detection capabilities
The advanced process expert for multi-pressure ALD/CVD and etch.
- xParts coated for extended lifetime in harsh chemistry
- Multi pressure sampling inlet
- Detection limit below 10 ppb
- Industry leading pumping speed
Advanced process expert for Single Pressure ALD/CVD and Etch.
- xParts coated for extended lifetime in harsh chemistry
- High temperature single pressure inlet
- Detection limit below 10 ppb
- Industry leading pumping speed
The compact process expert for advanced process monitoring.
- HexBlock multi-pressure sampling inlet
- Detection limit below 200 ppb
- Industry leading pumping speed
- 30% decrease in system volume
Detect volatile organic compounds in industrial manufacturing settings.
- Real-time detection
- Superior sensitivity
- Easy data interpretation
- Seamless tool integration
Real-time gas analysis that drives yield, uptime, and process control.
- Industry leading maximum operating pressure
- Optional overpressure isolation valve interlock
- Scans up to 100 amu
Gain unparalleled performance for increased yields and maximum uptime.
- Nine-decade dynamic range
- Industry leading data collection rate
- Interchangeable sensors and electronics
- Scans up to 300 amu
Optimize your process by monitoring conditions, detecting contaminants, and checking for leaks.
- Nine-decade dynamic range
- Interchangeable sensors and electronics
- Optional continuous dynode electron multiplier
- Scans up to 200 amu
Minimize wafer and panel scrap with the most sensitive air leak and process contamination detection for single-pressure applications.
- Targeted high pressure processes
- Single pressure sampling inlet
- Detection limit below 1 ppm
- Integrated differential pumping system