Real-time Leak Detection, Endpoint Detection and Process Monitoring
Flange connection to vacuum chamber
Analog output signal
DN 16 ISO-KF
1.2 - 8.68 V
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INFICON Quantus HP100 gas analyzer is based on Self-Plasma Optical Emission Spectroscopy (SPOES) technology and is designed to provide real-time leak detection, endpoint detection and process monitoring during semiconductor manufacturing. Quantus HP100 has excellent sensitivity, a compact form factor and offers wide operational pressure range without costly pumps, making it well suited for process monitoring and protection in most semiconductor tools.
Operating range of 1 Torr – 450 Torr for Argon and 1 Torr – 120 Torr for Nitrogen (Varies for other gas species)
Low detection limits <1 ppm
Easy installation using a standard KF25 connection
Fast sampling (20 Hz maximum)
Small footprint (H x W x L): 6.4 x 6.0 x 8.3 in. [162 x 153 x 210 mm]
Low maintenance, no pumps or consumables required
Convenient field-replaceable plasma cell
Worldwide expert support for your particular process needs