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HP100 SP-OES Introduction
Real-time gas analysis at high pressure without a differential pumping system
About the webinar
Traditional optical emission spectroscopy (OES) only works in bright plasma chambers. Our Quantus® HP100 changes that. Using Self-Plasma OES (SP-OES) technology, it generates its own local plasma — bringing real-time gas composition monitoring to dark chambers, forelines, and exhaust lines where conventional tools can't reach.
This webinar covers how the HP100 fits into our residual gas analyzer family, the science behind plasma generation and optical detection, and real application examples — including precise leak location that cuts detection time from weeks to a single day. You'll also see how the Quantus LP100 and HP100 compare across pressure ranges, detection limits, and integration with FabGuard software.
Whether you're optimizing semiconductor etch processes, monitoring CVD chambers, or looking for faster ways to locate leaks, this session shows you what's possible when gas analysis works at process pressure.
